An edition of Extreme ultraviolet (EUV) lithography (2010)

Extreme ultraviolet (EUV) lithography

22-25 February 2010, San Jose, California, United States

by Bruno M. La Fontaine

Bruno M. La Fontaine, Bruno M. ...

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Last edited by MARC Bot

September 24, 2020 | History

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An edition of Extreme ultraviolet (EUV) lithography (2010)

Extreme ultraviolet (EUV) lithography

22-25 February 2010, San Jose, California, United States

by Bruno M. La Fontaine

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Publish Date

2010

Publisher

SPIE

Language

English

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Edition	Availability
1 Extreme ultraviolet (EUV) lithography: 22-25 February 2010, San Jose, California, United States 2010, SPIE in English 0819480509 9780819480507	aaaa Locate

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Book Details

Edition Notes

"SPIE advanced lithography"--Cover.

Includes bibliographical references and author index.

Published in: Bellingham, Wash
Series: Proceedings of SPIE -- v. 7636, Proceedings of SPIE--the International Society for Optical Engineering -- v. 7636.

Classifications

Library of Congress: TK7872.M3 E986 2010

The Physical Object

Pagination: 2 v. :

ID Numbers

Open Library: OL24498480M
ISBN 10: 0819480509
ISBN 13: 9780819480507
LCCN: 2010459440
OCLC/WorldCat: 647772811

Source records

Library of Congress MARC record
Library of Congress MARC record

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Created December 4, 2010
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September 24, 2020	Edited by MARC Bot	import existing book
December 4, 2010	Created by ImportBot	Imported from Library of Congress MARC record

Extreme ultraviolet (EUV) lithography

22-25 February 2010, San Jose, California, United States

by Bruno M. La Fontaine