An edition of Extreme ultraviolet (EUV) lithography (2010)

Extreme ultraviolet (EUV) lithography

22-25 February 2010, San Jose, California, United States

by

Extreme ultraviolet (EUV) lithography
Bruno M. La Fontaine, Bruno M. ...
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Last edited by MARC Bot
September 24, 2020 | History
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An edition of Extreme ultraviolet (EUV) lithography (2010)

Extreme ultraviolet (EUV) lithography

22-25 February 2010, San Jose, California, United States

by

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Publish Date
Publisher
SPIE
Language
English

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Subjects

Ultraviolet radiation, Congresses, Photolithography, Lasers, Extreme ultraviolet lithography, Optical coatings, Industrial applications

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Edition Availability
Cover of: Extreme ultraviolet (EUV) lithography
Extreme ultraviolet (EUV) lithography: 22-25 February 2010, San Jose, California, United States
2010, SPIE
in English
  • Not in Library
Libraries near you: WorldCat

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Book Details

Edition Notes

"SPIE advanced lithography"--Cover.

Includes bibliographical references and author index.

Published in
Bellingham, Wash
Series
Proceedings of SPIE -- v. 7636, Proceedings of SPIE--the International Society for Optical Engineering -- v. 7636.

Classifications

Library of Congress
TK7872.M3 E986 2010

The Physical Object

Pagination
2 v. :

ID Numbers

Open Library
OL24498480M
ISBN 10
0819480509
ISBN 13
9780819480507
LCCN
2010459440
OCLC/WorldCat
647772811

Source records

Library of Congress MARC record
Library of Congress MARC record

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History

Download catalog record: RDF / JSON / OPDS | Wikipedia citation
September 24, 2020 Edited by MARC Bot import existing book
December 4, 2010 Created by ImportBot Imported from Library of Congress MARC record