| Record ID | marc_records_scriblio_net/part15.dat:130439781:802 |
| Source | Scriblio |
| Download Link | /show-records/marc_records_scriblio_net/part15.dat:130439781:802?format=raw |
LEADER: 00802cam 22002658a 4500
001 2005025505
003 DLC
005 20050919203829.0
008 050831s2005 wau b 001 0 eng
010 $a 2005025505
020 $a0819458457
040 $aDLC$cDLC$dDLC
042 $apcc
050 00 $aQC459$b.E98 2005
082 00 $a621.36/4$222
245 00 $aEUV sources for lithography /$cVivek Bakshi, editor.
260 $aBellingham, Wash. :$bSPIE Press,$c2005.
263 $a0511
300 $ap. cm.
504 $aIncludes bibliographical references and index.
650 0 $aUltraviolet radiation$xIndustrial applications.
650 0 $aPlasma (Ionized gases)
650 0 $aLithography.
700 1 $aBakshi, Vivek.
856 41 $3Table of contents$uhttp://www.loc.gov/catdir/toc/ecip0518/2005025505.html