| Record ID | marc_loc_updates/v37.i11.records.utf8:8974942:973 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_updates/v37.i11.records.utf8:8974942:973?format=raw |
LEADER: 00973cam a22003014a 4500
001 2005025505
003 DLC
005 20090313092227.0
008 050831s2006 waua b 001 0 eng
010 $a 2005025505
015 $aGBA591070$2bnb
016 7 $a013321711$2Uk
020 $a0819458457
035 $a(OCoLC)ocm61458266
040 $aDLC$cDLC$dUKM$dC#P$dBAKER$dDLC
042 $apcc
050 00 $aQC459$b.E98 2006
082 00 $a621.36/4$222
245 00 $aEUV sources for lithography /$c[edited by] Vivek Bakshi.
260 $aBellingham, Wash. :$bSPIE Press,$cc2006.
300 $axxxv, 1057 p. :$bill. ;$c27 cm.
504 $aIncludes bibliographical references and index.
650 0 $aUltraviolet radiation$xIndustrial applications.
650 0 $aExtreme ultraviolet lithography.
650 0 $aPlasma (Ionized gases)
650 0 $aLithography.
700 1 $aBakshi, Vivek.
856 41 $3Table of contents$uhttp://www.loc.gov/catdir/toc/ecip0518/2005025505.html